Samsung's Delay in Testing Korean-Made Photomask Films Surprises Industry, Despite Investment in S&S Tech and FST

According to a report from The Elec, South Korean companies are actively developing mask films with high transparency rates to expand the use of EUV lithography. S&S Tech has developed a product with a transparency rate of 91%, while FST has developed a product with a transparency rate of nearly 90%. Both companies have confirmed the durability of their mask films in laboratory tests.

Samsung has invested in S&S Tech and FST in 2020 and 2021, respectively, to promote the development of domestically-made mask films. With Samsung's support, the two companies have successfully developed their products over the past two years. However, Samsung has not announced a commercialization timeline, which has surprised the South Korean industry as Samsung has a need for EUV mask films.

Samsung is concerned that the high power output of EUV lithography could cause the mask films to rupture, leading to equipment failure and costly downtime for cleaning and maintenance. As a result, Samsung is hesitant to test the mask films on its production line, even though S&S Tech and FST need to test their products in Samsung's EUV lithography system to assess the risk of damage and develop appropriate countermeasures.

The South Korean industry believes that EUV mask films are essential to improving productivity in the EUV lithography process, but testing is necessary to assess related risks. As the only place to test EUV mask films in South Korea, Samsung must take on this responsibility, especially during a downturn in the semiconductor market when many companies are reducing production or lowering their utilization rates. South Korea's EUV ecosystem can only thrive if Samsung takes the initiative to test the mask films and accumulate data.