ASML Delivers First High-NA EUV Lithography to Intel

On December 21, ASML, the leading Dutch semiconductor equipment manufacturer, announced the imminent delivery of its groundbreaking "High NA" extreme ultraviolet (EUV) lithography systems to Intel. Each of these cutting-edge machines carries a price tag exceeding $300 million, poised to empower computer chip manufacturers in the production of smaller and faster semiconductors.

The company shared compelling visuals of the departure of the High NA EUV system from its Veldhoven headquarters in the Netherlands, packaged meticulously in a protective box adorned with a distinctive red ribbon. ASML expressed its excitement and pride, stating, "We are thrilled and proud to deliver our first High NA EUV system to Intel."

As a dominant force in the lithography system market, ASML's High NA machines, upon assembly, surpass the size of a truck and necessitate transportation in 250 separate panel crates, including 13 large containers. The utilization of these machines for commercial chip manufacturing is anticipated to commence around 2026 or 2027.

Intel, in 2022, became the inaugural recipient of a High NA experimental machine, marking a significant milestone. Other notable chip manufacturers, such as TSMC, Samsung, SK Hynix, and Micron, have also embraced this cutting-edge technology with orders placed for these advanced lithography systems. ASML had previously communicated its expectation to deliver the initial batch of pilot tools by the end of the current year, as outlined in their November statement.