Canon's Nanoprinted Lithography: Now Crafting 2nm Chips!

In a groundbreaking development on October 13th, Japanese industry leader Canon introduced its cutting-edge Nanoprinted Lithography (NIL) device, the FPA-1200NZ2C. This technology represents a significant leap forward in chip manufacturing capabilities, according to Fujio Mitarai, Canon's esteemed CEO.

Unlike conventional photolithography techniques reliant on optical image projection, Nanoprinted Lithography takes inspiration from printing processes. By directly imprinting intricate patterns onto silicon wafers, this innovative technology enables the creation of complex 2D or 3D circuit layouts with a single imprint.

Canon's nanolithography breakthrough is particularly notable in the semiconductor manufacturing landscape dominated by ASML's EUV lithography machines, each priced at approximately $150 million. For processes as advanced as 2nm and below, ASML's High-NA EUV lithography machine comes at a staggering cost, potentially exceeding $300 million.

What sets Canon apart is not only the democratization of access to advanced chip production but also the cost-effectiveness of their nanolithography equipment. Canon's solution empowers semiconductor manufacturers to produce logic semiconductors at the minimum 5nm process node without the dependency on EUV lithography machines.

According to Norihiro Iwamoto, Canon's Semiconductor Equipment Business Division Manager, with further enhancements, nanolithography could extend its capabilities to produce chips for advanced 2nm processes, potentially narrowing the technological gap with industry leaders.

Crucially, Canon's nanolithography equipment boasts significantly lower costs, both in terms of the device itself and the associated manufacturing expenses when compared to ASML's EUV lithography machines. Iwamoto notes that customer costs can be notably reduced, with estimates suggesting that the expense of one imprinting process may be halved in comparison to traditional exposure equipment processes.

In addition to its cost advantages, Canon's nanolithography equipment, due to its smaller scale, offers enhanced accessibility for research and development purposes.

Fujio Mitarai, Canon's CEO, emphasizes the competitive pricing of their nanolithography equipment, positioning it as a compelling alternative to existing solutions. Canon has received numerous inquiries from semiconductor manufacturers, universities, and research institutes, indicating a strong anticipation for the potential applications of this technology.

Canon's Nanoprinted Lithography technology is expected to find diverse applications in semiconductor production, including but not limited to flash memory, personal computer DRAM, and logic.