Intel Expands High NA EUV Lithography Purchases

According to reports, Intel has ramped up its purchase of ASML's High NA (High Numerical Aperture) EUV lithography machines, signaling a strong push for its Intel 14A (1.4nm) process technology.

Intel is set to acquire two High NA EUV machines from ASML, one more than previously planned, signaling a significant increase in its investment in future chip manufacturing technologies. The Intel 14A process will rely on High NA EUV lithography, which is expected to revolutionize Intel's manufacturing capabilities, especially within its Integrated Device Manufacturing (IDM) segment.

Intel has made it clear that the success of Intel 14A is crucial for its IDM division's future. If the 14A node fails to gain widespread customer adoption, Intel has indicated that it may scale back its focus on high-end nodes. As a result, the upcoming Intel 14A launch will be a critical moment for the company.

High NA EUV machines are already being used by major players such as TSMC, Samsung, SK Hynix, and Intel itself for next-generation products. Each High NA EUV machine costs approximately $370 million (around ¥2.6 billion), and Intel is expected to spend between $1 billion and $2 billion (approximately ¥14.2 billion) on lithography equipment alone. This makes Intel one of the primary adopters of the High NA EUV technology.

As Intel targets a groundbreaking release of its Intel 14A process, the capital expenditures for related foundry services are expected to rise significantly. However, with the company's heavy reliance on these nodes for both its foundry division and its broader ambitions for U.S. chip manufacturing, achieving success with Intel 14A and the future Intel 18A (1.8nm) process remains a formidable challenge.