Following Intel and TSMC, Samsung, SK Hynix place orders for ASML's next-generation 2nm EUV equipment

According to Korean media reports, ASML's financial report said that in the EUV High-NA business, the company received additional orders for TWINSCAN EXE:5200, and all current EUV customers have placed orders for the next-generation semiconductor equipment "High-NA", among which Including Samsung and SK Hynix.

It is reported that the High-NA EUV device is a device in which the lens aperture number (NA), which represents the light-gathering ability of light, has been increased from 0.33 to 0.55. Compared with existing EUV devices, High-NA EUV devices can draw finer semiconductor circuits. Therefore, it is generally believed in the industry that High-NA equipment will play a key role, or even a necessary condition, to realize the 2nm process. Intel and TSMC have already announced orders for "High-NA" EUV equipment. With the entry of Samsung Electronics and SK Hynix, the competition for 2nm process technology will become more intense.

According to Korean equipment manufacturers, the order price of the current EUV lithography machine is 200-300 billion won, while the price of the high-NA EUV lithography machine has doubled to 500 billion won.

Peter Wennink, CEO and President of ASML, said: "Due to a number of global macroeconomic issues, including inflation, falling consumer confidence, recession risks, and other global macroeconomic issues, the market is uncertain, although different demand changes are perceived in different markets. But overall ASML's system demand remains strong," it said. "In this case, booking sales in the third quarter were approximately 8.9 billion euros, of which EUV equipment sales such as the High-NA system reached 3.8 billion euros."

However, according to Korean media reports, Samsung and SK Hynix said when introducing High-NA EUV equipment: "This is something that cannot be officially disclosed."