New Partnership between NVIDIA, ASML, Synopsys, and TSMC to Revolutionize Chip Design and Manufacturing with cuLitho Software

According to recent reports from foreign media, NVIDIA has announced at the GTC conference that it will partner with ASML, Synopsys, and TSMC to promote the use of its "cuLitho" software library for computational lithography. This will enable its partners to design and manufacture next-generation chips with higher efficiency.

NVIDIA believes that by running the complex IC lithography pattern calculations on GPUs instead of general-purpose CPUs, computing efficiency can be increased by 40 times. The cuLitho software is used to convert workloads into formats that can leverage GPU parallelism. This allows 500 NVIDIA DGX H100 systems to perform the work of 40,000 CPU systems.

Using cuLitho, wafer fabs can produce three to five times the number of photomasks per day while using only one-ninth of the power. The company also claims that photomasks that take two weeks to produce can be processed overnight using cuLitho and GPUs. In the long run, cuLitho will enable better design rules, higher density, higher yields, and provide a pathway to AI-driven lithography technology.

Huang Renxun also revealed that the Hopper architecture GPU will use the cuLitho library for design and manufacturing. TSMC also responded by saying, "This development opens up new possibilities for TSMC to more widely deploy inverse lithography technology and lithography solutions driven by deep learning in chip manufacturing, making important contributions to the continued development of the semiconductor industry."

This news highlights the importance of technological advancements in lithography and the potential for greater efficiency and productivity in the manufacturing process. It presents an opportunity to partner with NVIDIA and other companies involved in this technology to offer the latest and most innovative solutions to customers.